B3 Solar cells Resistive switching Titanium dioxide Band alignment 3 nm in size Bixbyite SF 6 Sol-gel Rutile A Multilayers Oxides Plasmas froids Ablation laser TEM BOMBARDMENT AlN Selenization Etching Low-pressure plasma processing Semiconductors Chalcogenide Optical waveguides Residual stress CH4 Magnetron sputtering Capacitance Films Carbon Nanotube Plasma etching Ambipolar material Biofilms microbiens NEXAFS Avalanche breakdown V2O3 A Chalcogenides Nanotubes Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation CaTiO3Pr^3^+ Sputtering Mott insulator Thin films Bipolar resistive switching BRS Structure Non-volatile memory AuCu alloy B1 Inorganic compounds Colloidal solution CHLORINE PLASMAS Mass spectrometry Thin film Alzheimer's disease B2 Semiconducting alloys Amyloid precursor X-ray photoelectron spectroscopy Transmission electron microscopy Biomasse Aluminium nitride Buffer Couple Functionalization Scanning electron microscopy Atomic layer etching Band gap PECVD Biocapteurs Kirkendall effect Nanocomposite A-CNx Atomic force microscopy B2 Semiconducting indium compounds X-ray diffraction Physical vapor deposition B2 Quaternary Adsorption TiO2 XPS Integrated optics CIGSe Anatase Mott insulators CNTs’ collapse Optical interferometry A1 Characterization A3 Physical vapor deposition processes A Thin films Calcined clay C Photoelectron spectroscopy Optical properties Spectroscopic ellipsometry Aryl-diazonium salts Vanadium Sesquioxide Carbon Biomembranes Amorphous Transfert d'énergie Applications industrielles Annealing B Chemical synthesis AZO thin films Alloying Copper